Electron beam nanolithography (EBL) is a cutting-edge technology used to create extremely fine patterns on a substrate. This process involves using a focused beam of electrons to write custom patterns onto a resist-coated surface. The high precision of EBL makes it ideal for applications requiring extremely detailed and accurate features, such as in semiconductor fabrication and nanotechnology. By manipulating the electron beam, it’s possible to achieve resolutions down to the nanometer scale, allowing for the creation of intricate designs and structures.
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