The SurPass 3000 cationic photoresist adhesion promoter is engineered to address adhesion challenges in advanced lithography. By modifying substrate surface energy, it ensures strong resist bonding while minimizing interfacial defects. Compatible with both positive and negative resists, SurPass 3000 enhances pattern fidelity across materials like silicon, glass, and III-V compounds. Trust DisChem to deliver promoters that elevate adhesion without introducing complexity.
